Facilities

Microwave magnetism platform

4 picoprobes and K cables

  •  C2N’s microwave magnetism measurement platform includes several probe stations with on-chip calibration capacity and variable magnetic field sources:
  1. Multipurpose probe stations: 3D orientable field of 280 mT in plane or 700 mT out-of plane field with up to 6 RF probes (4×40 GHz & 2×67 GHz) and up to 4 DC probes.
  2. Cryogenic (5–450 K) probe station with 4×40 GHz probes, 2D vector in-plane field up to 115 mT and 30 mT out-of-plane field.
  3. High field (2.5 T) probe station with 70 GHz capability.

Our microwave magnetism measurement platform is equipped with state of the art instruments including a vector network analyser (70 GHz), a spectrum analyser (50 GHz), with the dedicated low noise preamplifiers, a single-shot oscilloscope with 6 GHz of true analogue bandwidth and with a 40 GHz trigger prescaler, and an equivalent-time-domain oscilloscope with 67 GHz true analogue bandwidth.

  • Kerr microscopy

domains occupying half a wire

Perpendicular magneto-optic Kerr effect (MOKE) microscope with

  • 500 nm resolution at room temperature
  • Perpendicular fields up to 600 mT
  • In-plane fields up to 35 mT
  • Two picoprobe contacts up to 70 GHz

 

Magnetometry

AGFM

MOKE

Film deposition

batipulve

·     Our deposition cluster is a research tool optimized for the deposition of metals and oxides thin films at low deposition rates, under a base vacuum of 10-8 mbar and a typical argon working pressure of 5×10-4 mbar in magnetron mode. It is equipped with 8 sputtering cathodes and more than 30 available targets, and each cathode can be powered in DC or RF mode. The sampler holder incorporates permanent magnets for in-field deposition, and it can be heated up to 400°C. Our sputtering machine can accept 8 inch wafers, although the uniformity of the deposition is ensured only over 2 inches. The cluster connects the sputtering system to a Chemically Assisted Ion Beam Etching tool and an UHV Pulsed Laser Deposition system, optimized for the deposition of piezoelectric materials.

Computational Cluster

The group possesses a small computation cluster for micromagnetics simulations (mumax2, mumax3, OOMMF) and finite-element electromagnetics simulations (COMSOL).

Graphics processing units (GPUs) for high-performance computing:

  • 3 × NVIDIA GTX 980
  • 3 × NVIDIA GTX 680
  • 2 × NVIDIA Quadro 4000
  • Access to 4 × NVIDIA Tesla K20X